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A cheaper way to scale up atomic layer deposition
by Staff Writers
Lausanne, Switzerland (SPX) Nov 12, 2019

An artistic illustration of atomic layer deposition.

Atomic layer deposition (ALD) involves stacking layers of atoms on top of each other like pancakes. The atoms come from a vaporized material called a precursor. ASD is a well-established technique for manufacturing microelectronics like semiconductors and magnetic heads for sound recording, as well as sensors for bioengineering and diagnostics.

However, using ALD for depositing layers on larger surfaces has been a struggle, especially when it comes to manufacturing materials that must be kept at low cost, e.g. catalysts and solar devices.

"The sticking point is not necessarily making the right material but making it cheaply," explains Professor Jeremy Luterbacher, head of EPFL's Laboratory of Sustainable and Catalytic Processing (LPDC).

"Coating larger surface areas with gas-phase methods requires long deposition times, and huge excesses of precursor, both of which increase costs," adds Benjamin Le Monnier, the PhD student who performed most of the research.

Now, the LPDC has developed a solution. Using ALD in a liquid phase, the scientists can produce materials indistinguishable from those made in the gas phase, with far cheaper equipment and no excess precursors.

Greater precision cuts costs
The researchers achieved this breakthrough by carefully measuring the ratio of the reacting precursors before injecting them onto the surface of a substrate. This way, they used exactly the right amount of precursor, with no leftovers that can cause unwanted reactions or be wasted.

The new method also reduces costs by requiring only standard lab equipment for chemical synthesis. It can also be easily scaled up to coat more than 150 g of material with the same cheap equipment, without loss of coating quality. The technique can even achieve coatings that are not possible using gas-phase ALD, e.g. by using non-volatile precursors.

"We believe that this technique could greatly democratize the use ALD on catalysts and other high surface area materials," says Luterbacher.

Research Report: "Atomic layer deposition on dispersed materials in liquid phase by stoichiometrically limited injections"


Related Links
Ecole Polytechnique Federale de Lausanne
Space Technology News - Applications and Research


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TECH SPACE
New printer creates extremely realistic colorful holograms
Washington DC (SPX) Nov 03, 2019
Researchers have developed a new printer that produces digital 3D holograms with an unprecedented level of detail and realistic color. The new printer could be used to make high-resolution color recreations of objects or scenes for museum displays, architectural models, fine art or advertisements that do not require glasses or special viewing aids. "Our 15-year research project aimed to build a hologram printer with all the advantages of previous technologies while eliminating known drawbacks such ... read more

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